TSMC reportedly receives the first batch of high NA EUV lithography machines from ASML before the end of the year
阿豆学长长ov
发表于 2024-11-1 15:44:54
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TSMC will receive the first batch of the latest high numerical aperture extreme ultraviolet (high NA EUV) lithography machines from Dutch lithography manufacturer ASML before the end of this year. This batch of machines costs approximately $350 million each and will be used to produce the next generation of semiconductors. (Nikkei News)
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Disclaimer: The views expressed in this article are those of the author only, this article does not represent the position of CandyLake.com, and does not constitute advice, please treat with caution.
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